Description Overview Vertical furnace with small footprint for high-quality processing. Nano Therm’s vertical furnaces are compact and requires only a small installation area and can process wide range of wafer diameters. Applications annealing thermal oxide LPCVD wet oxidation dry oxidation Specifications Operational Temperature range Up to 1300 c deg Supported wafer sizes 75mm to 200mm Maximum lot size 12 wafer boat standard (50 wafers optional ) Gases used N2, Ar & N2 ,(other gasses available upon request) Applications Annealing Thermal oxide LPCVD Wet oxidation Dry oxidation SiC power devices Element Section Dimensions Configurable The Nanotherm Fabline can process 75mm – 200mm wafers up to 50 at a time. Carefully selected hardware and control system features enable continuous high temperature wafer processing. The Nanotherm Fabline vertical Furnace’s also has the option to be capable of 1300C operation. The Nanotherm’s Primary Heating and Controls are manufactured by a proprietary source that has been producing high temperature furnaces heating systems up to 1300 °C since 1982. Please contact us for more information on the product: Your Name*: Your Email: Your Message: Captchac Code Submit: [dynamichidden dynamichidden-813 "CF7_URL"] Δ Share the post "NANOTHERM FABLINE 150" FacebookXShare…
