Description Nano-Master Main Equipment: Thin Film | Etch | Cleaning | Space Simulation | Hybrid NLE-4000 hybrid PAALE/ PEALD (Brochure Download) NLE-4000 Cross Section with RF biasing for Shower Head with Planar ICP source The NANO-MASTER NLE-4000 is a stand-alone hybrid PAALE/PEALD system for performing plasma-enhanced atomic layer deposition (PEALD) as well as plasma-assisted atomic layer etching (PAALE). Both processes can be performed in a single chamber without any mechanical reconfiguration. It is CE and SEMI Standards-compliant. The system is controlled with LabVIEW software and features three-level password-controlled user authorization using a touch-screen monitor. The system is fully automated, safety-interlocked, recipe-driven, with status indicators and graphic and alphanumeric displays. Widely used in na-noscale fabrication, MEMS, quantum devices, and advanced semiconductor technologies, our hy-brid PAALE/PEALD system is able to provide damage-free Plasma Assisted Atomic Layer Etching. Nano-Master ALE systems provide soft Atomic Layer Etching using our unique Planar Inductive Coupling Plasma (ICP) source. Atomic Layer Etching (ALE) is a precise material removal technique used in semiconductor manu-facturing that operates at the atomic level. This method ensures ultra-thin layer removal with high fidelity, allowing for selective etching of specific materials while minimizing damage to adja-cent areas. ALE enables precise control over surface morphology, making it essential for advanced device architectures. Characterized by low etch rates, it is ideal for applications requiring meticu-lous layer management typically in the order of monolayers. The process involves alternating cy-cles of surface modification and etching, which enhance uniformity and reproducibility. Addition-ally, ALE is compatible with a variety of materials, including silicon, metals, and dielectrics, and it reduces substrate damage, preserving electrical properties. Patented Dual capability (PAALE/PEALD) in the same chamber without any mechanical reconfiguration. For the ALE process, only radicals from the planar ICP source are generated for adsorption ( Patented) Soft Ar etching is performed by applying RF to the shower head to remove the adsorbed radicals for ALE. Precise Atomic layer etching of 0.8Å to 1Å /cycle Removing native oxide with PAALE and depositing the passivating layer Si3N3 with PEALD in the same chamber without exposing it to the atmosphere. Minimal chamber volume for fast cycle time and throughput Continuous ALD process for depositing passivating layer with less than 1Å uniformity Plasma contact with the substrate is eliminated with Nano-Master’s patented ALD process. CE and SEMI standard Features: 13″ Ni-plated Al chamber w/ heated chamber wall 2×10-6 Torr base pressure attained with turbo pumping package NM-Planar ICP source with shower head gas distribution. High surface ALD filter at the chamber exhaust Level precursor distribution Up to 8″ substrate, heated upto 400℃ ( Biasble) for ALE process RF biasing for shower head – Soft ALE etching Onboard precursor glovebox for ALD cylinders Separate gas pod for toxic gasses with gas leak sensors for ALE gasses Up to seven 50cc precursor cylinders 360 l/sec Heated maglev turbomolecular pump 2×10-6 torr base pressure Fast pulse gas delivery valves Large area filter to capture unreacted precursors High aspect ratio structure coating MFC’s with electropolished gas lines and pneumatic shut-off valves Fully automated PC based, recipe driven LabVIEW user interface EMO protection and Computer-controlled safety interlocks 26″ x 44″ footprint with enclosed panels ideal for cleanrooms Options Separate gas pod for reactive/toxic gasses with gas leak sensors Applications: Precise etching of native oxide Power Electronics Etching 2-D Materials The trademarks of the equipment and parts contained on this page belong to the Original Equipment Manufacturers. Please contact us for more information on the product: Your Name*: Your Email: Your Message: Captchac Code Submit: [dynamichidden dynamichidden-813 "CF7_URL"] Δ Nano-Master Main Equipment: Thin Film | Etch | Cleaning | Space Simulation | Hybrid SS10840 Share the post "NLE-4000 PAALE PEALD" FacebookXShare…
