Description 2003 Oxford PlasmaLab System 133 RIE Reactive Ion Etcher Location: Nanjing, Jiangsu, China OXFORD Plasmalab 133 RIE (CL) Model Year : 2003 Quantity : 1 Condition : Refurbished with OEM specifications ,crating, warranty, installation if necessary at different prices. Serial No : 417718 Availability : Subject to prior sale without notice. Configuration: Supports wafer sizes up to 300mm (330mm Platen) RIE set up for GaN Etch RF Power: 600W, 13.56MHz Water cooled electrode 10C-80C Load Lock with turbo pump End point detection: Verity Optical emission spectroscopy (200-800nm) Gas pod with 6 lines including following MFCs: Ar – 100sccm CL – 100sccm BCL3 – 100sccm N2O – 100sccm Windows PC, User friendly interface This tool was removed from production October 2014. Chiller, Pump are not included. Please contact us for more information on the product: Your Name*: Your Email: Your Message: Captchac Code Submit: [dynamichidden dynamichidden-813 "CF7_URL"] Δ MSP-175K-195K Share the post "Oxford 133 -SN-417718" FacebookXShare…
