Description STS / SPTS Multiplex ICP HRM Etcher EtcherProcess: MEMS-CMOS Temperature: -20-100°C Substrate: Small piece Process pressure: 5-80 mTORR Gases: SF6, C4F8, Ar, O2, C2 HBC with ESC Masks: SiO2, SixNy Materials used: Si, SOI wafers Coil: 3000 W 13.56 MHz (ADVANCED ENERGY) HF: 500 W, 13.56 MHz (ENI) LF: 500 W, 380 KHz (ADVANCED ENERGY LF-5). Condition: Used. We sell it at AS IS or complete, working, functional test . Valid : It is only for end users and is subject to prior sale without notice. Appreciate your time! SemiStar Corp. may provide certain information related to equipment offered for sale. Any and all such information is unverified and, therefore, supplied for information purposes only without guarantees or warranties of any kind. This picture is representative of the STS available Please contact us for more information on the product: Your Name*: Your Email: Your Message: Captchac Code Submit: [dynamichidden dynamichidden-813 "CF7_URL"] Δ OEM-32 / SS380 Share the post "Multiplex ICP HRM" FacebookXShare…
