Description Nano-Master Main Equipment: Thin Film | Etch | Cleaning | Space Simulation | Hybrid Roll-to-Roll Atomic Layer Deposition The roll-to-roll (R2R) plasma-enhanced atomic layer deposition (PEALD) system is designed for the continuous processing of flexible substrates and inline multilayer ALD coating on glass panels. The system addresses the need for high-throughput, uniform, and conformal thin film deposition on flexible materials, which is critical for applications such as flexible electronics, displays, barrier coatings, and panels. NANO-MASTER’s patented continuous flow process doubles the throughput of traditional ALD systems. A few key advantages of roll-to-roll PEALD are: Continuous processing: The R2R configuration allows for uninterrupted deposition, which significantly increases throughput compared to batch processes. Uniform thin films: The combination of PEALD with R2R ensures highly uniform and conformal coatings, even on substrates with complex topographies. Scalability: The system is designed to be scalable for industrial applications, facilitating the mass production of components. Reduced thermal need: PEALD enables thin film deposition at lower temperatures, making it suitable for temperature-sensitive flexible substrates. ALD R2R System Key Features: Roll-to-roll substrate handling ECR enhanced hollow cathode source Onboard precursor delivery w/ fast pulse delivery valves Fully automated PC based, recipe driven Computer controlled safety interlocks LabVIEW user interface ALD R2R System Applications: Flexible electronics Barrier coatings for packaging Photovoltaic cells Sensors and actuators NanoMaster ALD System Typical Performance: (1) Uniformity: 0.36%, Wafer: 6″, Precursors: Trimethyl Aluminum and Water, Cycle: 100 cycles (TMA H2O), Expected Thickness: 100Å, Temperature: 200°C, Uniformity %: 0.36%, Refractive Index: 1.68″ (2) Uniformity: 0.27%, Wafer: 6″, Precursors: Trimethyl Aluminum and Water, Cycle: 300 cycles, Expected Thickness: 300Å, Temperature: 200°C, Uniformity %: 0.27%, Refractive Index: 1.67″ (3) GaN Deposition with NLD-4000 The trademarks of the equipment and parts contained on this page belong to the Original Equipment Manufacturers. Please contact us for more information on the product: Your Name*: Your Email: Your Message: Captchac Code Submit: [dynamichidden dynamichidden-813 "CF7_URL"] Δ Nano-Master Main Equipment: Thin Film | Etch | Cleaning | Space Simulation | Hybrid SS10840 Share the post "Roll-to-Roll ALD System" FacebookXShare…
