Description Nano-Master Main Equipment: Thin Film | Etch | Cleaning | Space Simulation | Hybrid Different Plasma Sources We offer a different kinds of plasma sources to fit your application, ranging from hollow cathode plasma sources to inductively coupled plasma sources. NANO-MASTER Four Antenna Planar ICP Source . Novel Four Antenna Coil Design for Planar Inductively Coupled Plasma Source for DRIE, ICP-RIE Applications. (Download Brochure) NANO-MASTER Shower Head Plasma Source SH-1000RF Shower Head Source Gases through RF Plate Secondary Plate to introduce other gasses to plasma Water Cooled Up to 600 W 0.02 Torr to 8 Torr operation 8″ active area ISO 250 Flange Hollow Cathode 13.56 MHz RF Plasma Sources Features: Operation over an extended power and pressure range. High plasma and radical species densities with excellent homogenity (1011 cm-3). Compatible with chemical reactive and non-reactive gases Cw and pulsed power operation Low contamination Options Linear type also available in 600 mm and 900 mm Applications: Plasma enhanced chemical vapor deposition (PECVD) Plasma polymerization, plasma cleaning, plasma etching Surface modification SLAN (SLot ANtenna) 2.45 GHz Microwave Plasma Sources Features: High plasma densities Pressure range from 10-5 mbar up to atmospheric pressure Compatible with chemically reactive and non-reactive gases Low contamination ECR and non-ECR operation Cw and pulsed operation Options Available in 4, 16 and 67 cm diameters Applications: Plasma enhanced chemical vapor deposition (PECVD) Plasma polymerization, plasma cleaning, plasma etching Surface modification Material science Inductively Coupled Plasma Source ICP-P 200 (13.56 MHz) Features: Planar coil with 200 mm diameter Extended power range (3-1200 W) Low ion energy with narrow energy spread High plasma and radical densities Low contamination Cw and pulsed operation Applications: Plasma enhanced chemical vapor deposition (PECVD) Plasma polymerization, plasma cleaning, plasma etching Surface modification MaterialS science The trademarks of the equipment and parts contained on this page belong to the Original Equipment Manufacturers. Please contact us for more information on the product: Your Name*: Your Email: Your Message: Captchac Code Submit: [dynamichidden dynamichidden-813 "CF7_URL"] Δ Nano-Master Main Equipment: Thin Film | Etch | Cleaning | Space Simulation | Hybrid SS10840 Share the post "Different Plasma Sources" FacebookXShare…
