Description Nano-Master Main Equipment: Thin Film | Etch | Cleaning | Space Simulation | Hybrid LSC-5000 Pelliclized and Unpelliclized Reticle Cleaning Systems (Download Cleaning Equipment brochure) The LSC-5000 is NANO-MASTER’s latest reticle cleaner with state-of-art technology and functionality. With automatic robotic reticle load/unload, the LSC-5000 fully automates the cleaning process allowing a precise, uniform, and repeatable cleaning. The LSC-5000 is capable of cleaning both the backside and the alignment marks on the front side of pelliclized masks, reducing the need for unnecessary removal and re-pelliclization of these masks. Megasonic cleaning and spin drying of the full front surface of the pelliclized mask is conducted without damage and seepage condensation on the pellicle. It is also capable of removing pellicle frame mounting adhesive and preparing surfaces for re-pelliclization. Capabilities: Two dual dispense arms: Linear arm provides uniform cleaning of front side alignment marks for pelliclized reticles Radial arm provides megasonic DIW cleaning with uniform energy for back side cleaning Pelliclized reticles clean: Reticle is mounted face down on the chuck and the back side is cleaned with the radial arm. Reticle is then dried, picked up and flipped. The pellicle protection cup is mounted onto the front side and the alignment marks are then cleaned with the megasonic DIW, brush and chemical dispense using the linear drive arm. Then chuck is rotated 180° and other side is cleaned. The reticle is dried and the protection cup is removed. Reticle loaded to SMIF box automatically Features: Robotic Loading/Unloading with EFEM and SMIF Interface Large Environmental Chamber Damage Free Megasonic Independent Chemical Dispenses Variable Speed Brush with Chemical Dispense PC Controlled with LabVIEW Software Touchscreen User Interface Datalogging Separate Drains for Solvents and Acids Safety Interlocks and Alarm Options: Bulk Fill Chemical Delivery Module Nitrogen Ionizer and CO2 Injector Piranha Cleaning Ozonated DI Water (20ppm of O3) High Pressure DI Water Heated DI Water Applications: Mask Blanks Pelliclized Reticles Un-Pelliclized Reticles Contact Masks The trademarks of the equipment and parts contained on this page belong to the Original Equipment Manufacturers. Please contact us for more information on the product: Your Name*: Your Email: Your Message: Captchac Code Submit: [dynamichidden dynamichidden-813 "CF7_URL"] Δ Nano-Master Main Equipment: Thin Film | Etch | Cleaning | Space Simulation | Hybrid SS10840 Share the post "LSC-5000 Reticle Cleaning" FacebookXShare…
