Description Nano-Master Main Equipment: Thin Film | Etch | Cleaning | Space Simulation | Hybrid NLP-4000 Hybrid PECVD/PEALD Systems (Brochure Download) Due to the chamber design and planar ICP source, both ALD and PECVD processes can be ran within the same system without the need of mechanical reconfiguration. The hybrid system al-lows for deposition of both thin ALD films and thick PECVD films within the same chamber and process (“recipe”). US Patent No.: 11,087,959 The NANO-MASTER NLP-4000 is a stand-alone hybrid PECVD/PEALD system for performing plasma-enhanced atomic layer deposition (PEALD) as well as plasma-enhanced chemical vapor deposition (PECVD). Both processes can be performed in a single chamber without any mechanical reconfiguration. It is also capable of depositing a stack of layers of PEALD/PECVD in the same process. It is CE and SEMI Standards-compliant and capable of processing up to 8” wafers. The system is controlled with LabVIEW software and features three-level password-controlled user authorization using a touch-screen monitor. The system is fully automated, safety-interlocked, recipe-driven, with status indicators and graphic and alphanumeric displays. Features: 13″ Ni-plated Al chamber w/ heated chamber wall 5×10-7 Torr base pressure attained with turbo pumping package ICP plasma source High surface ALD filter at the chamber exhaust Level precursor distribution Platen: Up to 400°C, biasable with RF, handles up to 8″ wafers Load Lock: Automatic load and unload MFC’s with electropolished gas lines and pneumatic shut-off valves Fully automated PC based, recipe driven LabVIEW user interface EMO protection and safety interlocks Options Provision for 150cc bubblers for Si or Ga for depositing PEVCD films. Seperate gas pod for reactive/toxic gasses with gas leak sensors Applications: Metallization and Gate Stack GaN G-HEMT Transistor Supercapacitor Power Electronics Gas Permeation Barrier Solar Cell Applications The trademarks of the equipment and parts contained on this page belong to the Original Equipment Manufacturers. Please contact us for more information on the product: Your Name*: Your Email: Your Message: Captchac Code Submit: [dynamichidden dynamichidden-813 "CF7_URL"] Δ Nano-Master Main Equipment: Thin Film | Etch | Cleaning | Space Simulation | Hybrid SS10840 Share the post "NLP-4000 PECVD PEALD" FacebookXShare…
